Protecting RNA quality for spatial transcriptomics while improving immunofluorescent staining quality

GND
1251786960
Zugehörigkeit
Section of Translational Neuroimmunology, Department of Neurology, Jena University Hospital ,Jena ,Germany
Hahn, Nina;
GND
1153795027
Zugehörigkeit
Leibniz Institute on Aging – Fritz Lipmann Institute (FLI) ,Jena ,Germany
Bens, Martin;
GND
1321550596
Zugehörigkeit
Section of Translational Neuroimmunology, Department of Neurology, Jena University Hospital ,Jena ,Germany
Kempfer, Marin;
GND
1312479396
Zugehörigkeit
Section of Translational Neuroimmunology, Department of Neurology, Jena University Hospital ,Jena ,Germany
Reißig, Christin;
GND
1269038540
Zugehörigkeit
Section of Translational Neuroimmunology, Department of Neurology, Jena University Hospital ,Jena ,Germany
Schmidl, Lars;
GND
130166030
Zugehörigkeit
Section of Translational Neuroimmunology, Department of Neurology, Jena University Hospital ,Jena ,Germany
Geis, Christian

In comparison to bulk sequencing or single cell sequencing, spatial transcriptomics preserves the spatial information in tissue slices and can even be mapped to immunofluorescent stainings, allowing translation of gene expression information into their spatial context. This enables to unravel complex interactions of neighboring cells or to link cell morphology to transcriptome data. The 10× Genomics Visium platform offers to combine spatial transcriptomics with immunofluorescent staining of cryo-sectioned tissue slices. We applied this technique to fresh frozen mouse brain slices and developed a protocol that still protects RNA quality while improving buffers for immunofluorescent staining. We investigated the impact of various parameters, including fixation time and buffer composition, on RNA quality and antibody binding. Here, we propose an improved version of the manufacturer protocol, which does not alter RNA quality and facilitates the use of multiple additional antibodies that were not compatible with the manufacturer protocol before. Finally, we discuss the influence of various staining parameters, which contribute to the development of application specific staining protocols.

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Rechteinhaber: Copyright © 2023 Hahn, Bens, Kempfer, Reißig, Schmidl and Geis.

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